SONOSYS Ultraschallsysteme GmbH is a German high-tech company specializing in advanced ultrasonic and Megasonic cleaning systems for industrial applications. Founded in 1995 and headquartered in Neuenbuerg, Germany, the company develops and manufactures highly efficient cleaning solutions operating in frequency ranges from 400 kHz up to 9 MHz. Its technologies are designed for the removal of microscopic particles and contaminants down to the nanometer scale.
The company serves demanding industries such as semiconductors, MEMS (Micro-Electro-Mechanical Systems), micro- and nanotechnology, optics, photovoltaics, and precision manufacturing. SONOSYS is particularly recognized for its expertise in “nanoClean” applications, enabling damage-free cleaning of sensitive surfaces including wafers, masks, and microstructures.
SONOSYS develops its products entirely in-house, including generators, transducers, nozzle systems, and complete Megasonic cleaning solutions. The company combines German engineering standards with continuous innovation and close collaboration with internationally renowned research institutes such as Fraunhofer, IMEC, and Karlsruhe Institute of Technology.
With more than 5,000 systems delivered worldwide over the past three decades, SONOSYS has established itself as a reliable technology partner for customers requiring high-precision cleaning processes. Its company motto, “Mastering nanoClean together,” reflects a strong customer-oriented philosophy focused on customized solutions, engineering support, and long-term partnerships.
Today, SONOSYS is regarded as an innovative specialist in Megasonic cleaning technology and continues to support global high-tech industries with efficient, compact, and future-oriented ultrasonic systems.

SONOSYS® has focused on the development of cleaning technologies operating in the high-frequency range from 400 kHz to 9 MHz.
The company’s Megasonic product portfolio includes compact high-performance generators, nozzle systems, transducers, submersible transducers, nebulizers, and complete cleaning modules for semiconductor cleaning. SONOSYS is especially recognized for its Megasonic nozzle technology, which enables highly efficient and damage-free cleaning of sensitive surfaces such as semiconductor wafers, lithography masks, LCD substrates, and micro- and nano-components.
Its single, double, and triple nozzle systems combine different frequencies between 600 kHz and 9 MHz to remove particles down to the nanometer range while maintaining maximum surface protection.
SONOSYS® also provides submersible transducers in standard sizes (4”, 6”, 8” and 12”) as well as customized transducers to meet customer’s needs. Another product in its portfolio are FTF transducers.
In the generator sector the latest innovation consists of a digital generator which offers precise power control and effortless integration into existing control systems using the Modbus protocol. This allows for real-time monitoring, adjustment, and improved process stability.